Joint Event - JE.V

School on SILICON MICRO- AND NANO-TECHNOLOGIES

June 12

Co-organized with

In the “European Strategy for Key Enabling Technologies”, the EU has defined six Key Enabling Technologies (KET): (1) micro- and nanoelectronics, (2) nanotechnology, (3) industrial biotechnology, (4) advanced materials, (5) photonics and (6) advanced manufacturing technologies, with a strong and well documented global impact. Most of these KETs require state-of-the-art facilities and competence on micro and nano-fabrication, a key area of science and technology that is radically changing our world. The aim of this one-day school is to give a high-level introduction and overview on the mandatory building blocks of the silicon-based micro- and nano-fabrication technologies. The course is dedicated to Master degree and Ph.D students, as well as to scientists working in the wide field of micro- and nano-technology. In the final part of the course examples of application of these technologies in global semiconductor companies will be presented.

The school is organized by It-fab (http://itfab.bo.imm.cnr.it/), the Italian network for Micro and Nano Fabrication research infrastructures, an initiative that aims to (i) establish harmonized rules, for clean room management and access policies, IP rules, external costs and reporting, (ii) harmonize and share design and simulation software, service contracts, management of professional services, (iii) define joint best practices for reciprocal support and backup, complementarities, standardization of clean room practices, interoperability and data exchange formats and (iv) define common information system for know-how, projects and equipment databases. Members of It-fab are CNR-DSFTM (IMM and Nanotec Institutes), PoliFAB from Politecnico di Milano, FBK-CMM and Fondazione Inphotec. It-fab is partner of the EuroNanoLab initiative (http://euronanolab.com)

Introduction
Lorenza FERRARIO, FBK

Deposition techniques

Riccardo BERTACCO, PoliFAB

JE.V.3

Litography

Alessandro NOTTOLA, INPHOTEC

Etching

Fulvio MANCARELLA, CNR

JE.V.5

Nanoscale characterization and metrology

Federico FERRARESE LUPI, INRIM 

Test structures and electrical characterization

Francesco FICORELLA, FBK

JE.V.7

Basic concepts of packaging

Giovan Battista PREVE, INPHOTEC

The MEMS Evolution: Materials, Sensors, and Actuators

Luca ZANOTTI, STMicroelectronics 

CMOS Image Sensors Technology

Giovanni DE AMICIS, LFoundry